Ion-solid interactions such as ion implantation, Rutherford backscattering/ion channeling, particle induced X-rays emission and neutron depth profiling as applied to thin films of silicides, oxides, nitrides, borides, and semiconductors in general. Projects include doping of high band gap materials to make them P and/or e-type conductors, improving near surface heavy impurity detection by a charge energy filter technique and creating micron-size systems for micro electro-mechanical applications by implantation lift-off of diamond structures
